SILICON NITRIDE LAMINATE FILM, ORGANIC ELECTROLUMINESCENCE ELEMENT, ELECTRONIC PAPER, OPTICAL ADJUSTING FILM AND PRODUCTION METHOD OF SILICON NITRIDE LAMINATE FILM

摘要

PROBLEM TO BE SOLVED: To provide a silicon nitride laminate film having sufficient gas barrier property and small warpage.SOLUTION: The silicon nitride laminate film according to the present invention includes a flexible substrate and a single thin film layer or a plurality of thin film layers formed on at least one surface of the flexible substrate. At least one specific thin film layer in the single thin film layer or the plurality of thin film layers comprises silicon, nitrogen and hydrogen; and a hydrogen distribution curve showing the relationship between a position in the film thickness direction and the content of hydrogen atoms within the specific thin film layer has at least one maximum point and at least one minimum point.SELECTED DRAWING: Figure 3