Simulation of the effects of shot noise in the particle beam writing process and especially in the electron beam writing process

摘要

The method involves depositing particles on a surface of a sample in a preset pattern by a beam of the particles, where the pattern is subdivided into pixels and a nominal dose of particles is associated with each of the pixels. A map (sigmad) of standard deviation in the normalized dose actually deposited in each of the pixels is calculated from a map (Mo) of the nominal dose associated with each pixel and a point spread function (PSF) characterizing the process, where the method is implemented by computer. Independent claims are also included for the following: (1) a computer program product for implementing a method simulating shot-noise effects in a particle-beam lithography process (2) and a computer programmed to implement a method for simulating shot-noise effects in a particle-beam lithography process.