CHARGED PARTICLE BEAM WRITING APPARATUS WRITING METHOD USING CHARGED PARTICLE BEAM AND SHOT CORRECTING METHOD OF CHARGED PARTICLE BEAM WRITING

摘要

A charged particle beam imaging apparatus for drawing a latent image of a fine pattern with a charged particle beam on the resist layer in a sample on which a resist layer is formed on a patterning member is provided with a test sample having a layer structure corresponding to the sample, , The correction information of each of the shot cross-sectional size and the shot irradiation position obtained from the in-plane distribution data of the XY dimensional fluctuation amount when a plurality of dimensional measurement patterns are formed under the condition A shot data creation processing device for creating shot data of each shot of the charged particle beam to be shot is provided.