首页> 外国专利> SPUTTERING TARGET FOR FORMING ADHESION LAYER OF HEAT-ASSISTED MAGNETIC RECORDING MEDIUM, AND ADHESION LAYER FOR HEAT-ASSISTED MAGNETIC RECORDING MEDIUM

SPUTTERING TARGET FOR FORMING ADHESION LAYER OF HEAT-ASSISTED MAGNETIC RECORDING MEDIUM, AND ADHESION LAYER FOR HEAT-ASSISTED MAGNETIC RECORDING MEDIUM

机译:形成热辅助磁记录介质粘附层的溅射靶标和形成热辅助磁记录介质粘附层的靶

摘要

PROBLEM TO BE SOLVED: To provide a sputtering target that can form an adhesion layer for a heat-assisted magnetic recording medium having both an amorphous structure and a high thermal conductivity, and an adhesion layer for a heat-assisted magnetic recording medium.;SOLUTION: A sputtering target for forming an adhesion layer of a heat-assisted magnetic recording medium has a compositional formula in an atomic ratio represented by Cr100-X-YNbXTiY, 5≤X≤70, 0≤Y≤50, and 35X+Y≤70, with the balance being inevitable impurities. There is also provided an adhesion layer for a heat-assisted magnetic recording medium.;SELECTED DRAWING: None;COPYRIGHT: (C)2018,JPO&INPIT
机译:解决的问题:提供一种溅射靶,该溅射靶可以形成具有非晶结构和高导热率的热辅助磁记录介质的粘附层以及热辅助磁记录介质的粘附层。 :用于形成热辅助磁记录介质的粘附层的溅射靶具有以Cr 100-XY Nb X Ti Y ,5≤X≤70、0≤Y≤50和35

著录项

  • 公开/公告号JP2017208148A

    专利类型

  • 公开/公告日2017-11-24

    原文格式PDF

  • 申请/专利权人 HITACHI METALS LTD;

    申请/专利号JP20160097796

  • 发明设计人 YAKABE HIDETAKA;FUKUOKA ATSUSHI;

    申请日2016-05-16

  • 分类号G11B5/851;C23C14/34;C23C14/14;G11B5/738;G11B5/02;

  • 国家 JP

  • 入库时间 2022-08-21 13:11:23

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号