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SPUTTERING TARGET MATERIAL FOR HEAT SINK LAYER FORMATION OF HEAT-ASSISTED MAGNETIC RECORDING MEDIUM
SPUTTERING TARGET MATERIAL FOR HEAT SINK LAYER FORMATION OF HEAT-ASSISTED MAGNETIC RECORDING MEDIUM
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机译:热辅助磁记录介质热沉层形成的溅射靶材
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摘要
PROBLEM TO BE SOLVED: To provide a sputtering target material for forming a heat sink layer of a heat-assisted magnetic recording medium with a sputtering method, which demands a high thermal conductivity and a smooth surface.;SOLUTION: This invention is a sputtering target material for a heat sink layer formation of a heat-assisted magnetic recording medium. In the sputtering target material, a compositional formula in an atom ratio is represented by Cu100-x-y-Zrx-Cry, 0.10≤x≤5.00, 0.10≤y≤1.00, and the remainder is made of inevitable impurities.;COPYRIGHT: (C)2014,JPO&INPIT
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机译:解决的问题:提供一种用于通过溅射法形成热辅助磁记录介质的散热层的溅射靶材,该溅射靶材需要高导热率和平滑的表面。用于形成热辅助磁记录介质的散热器层的材料。在溅射靶材中,以Cu 100-xy Sub> -Zr x Sub> -Cr y Sub>表示的原子比的组成式为0.10≤ x≤5.00,0.10≤y≤1.00,其余部分由不可避免的杂质制成。;版权:(C)2014,JPO&INPIT
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