MOLD BLANK FOR IMPRINT AND MOLD FOR IMPRINT

摘要

PROBLEM TO BE SOLVED: To provide a mold blank for imprint and a mold for imprint capable of preventing focus abnormality due to the back surface reflection light.SOLUTION: In a mold blank 10 for imprint having a light-transmissive substrate 1, and a hard mask layer 2 formed on the front surface 1a thereof, a thickness of the hard mask layer 2 is 5 nm or less, a phase shift film 3 is formed on the back surface 1b of the substrate 1 facing the front surface 1a, and a thickness of the phase shift film 3 is 2-6 nm. The phase shift film 3 is configured so that the light LB3 reflecting on the interface of the back surface 1b of the substrate 1 and the phase shift film 3 and returning back to the surface side, and the light LB7 reflecting on the interface of the phase shift film 3 and the outside and returning back to the surface side, are cancelled when the light impinges on the front surface of the substrate. Preferably, the phase shift film is configured so that the phase of the light LB3 and the phase of the light LB7 are substantially inverted.