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Small vacuum evaporation apparatus for analysis and analysis method for deposition of vapor deposition film

机译:用于分析的小型真空蒸发装置和气相沉积膜的沉积分析方法

摘要

PROBLEM TO BE SOLVED: To provide a small-sized vacuum vapor deposition device for analysis and a deposition film analytical method during film formation which can analyze in real time quality of a film during a process of forming a film on a substrate, especially, at the initial process of film formation.SOLUTION: In a small-sized vacuum vapor deposition device 100 for analysis which comprises a vessel 6, a first crucible holder and a second crucible holder arranged at the upper part in the vessel, a substrate support part 5 arranged at the lower part in the vessel, shutters 2a, 2b arranged at each of the plural crucible holders, and a shutter 3 arranged above the substrate support part 5, each of the crucible holders includes a glass-made crucible with an opening arranged below and a resistance heater, and vapor of material inputted into the glass-made crucible is heated by the resistance heater and is diffused to the lower side of the vessel. When the vapor reaches on the substrate 4 arranged at the substrate support part, a film is formed on the substrate.
机译:解决的问题:提供一种用于分析的小型真空气相沉积装置和成膜过程中的沉积膜分析方法,其可以实时分析在基板上成膜的过程中,尤其是在基板上的成膜质量。解决方案:在用于分析的小型真空气相沉积设备100中,该设备包括容器6,布置在容器上部的第一坩埚固定器和第二坩埚固定器,衬底支撑部分5设置在容器下部的闸板2a,2b设置在多个坩埚保持器中的每一个,以及闸板3布置在基板支撑部5上方,每个坩埚保持器包括玻璃制的坩埚,其开口设置在下方电阻加热器,输入到玻璃制坩埚中的材料的蒸气被电阻加热器加热,并扩散到容器的下侧。当蒸气到达布置在基板支撑部处的基板4上时,在基板上形成膜。

著录项

  • 公开/公告号JP6369930B2

    专利类型

  • 公开/公告日2018-08-08

    原文格式PDF

  • 申请/专利权人 国立大学法人岩手大学;

    申请/专利号JP20130272473

  • 发明设计人 菊池 護;吉本 則之;

    申请日2013-12-27

  • 分类号C23C14/24;H01L29/786;H01L21/336;H01L21/203;H01L21/66;

  • 国家 JP

  • 入库时间 2022-08-21 13:07:50

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