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DEVICE AND PROCESS FOR PREVENTING SUBSTRATE DAMAGES IN A DBD PLASMA INSTALLATION

机译:DBD等离子体安装中防止基体损坏的设备和过程

摘要

The present invention relates to a process for preventing substrate damages in an installation for surface treatment by dielectric barrier discharge (DBD) and a surface treatment DBD installation for carrying out such process. It comprises detecting the amplitude of the voltage at the terminals of the electrodes and the amplitude of the current circulating between said electrodes; defining the maximum number of alternations of voltage at the terminals of the electrodes in the presence of a hot electric arc (n max) in order not to exceed 50 Joules as dissipated energy in said substrate; when a hot electric arc appears between said electrodes, modifying with inverse feedback the voltage at the terminals of said electrodes before the defined maximum number of alternations of voltage at the terminals of the electrodes is reached.
机译:本发明涉及防止介电势垒放电(DBD)进行表面处理的设备中的衬底损坏的方法以及进行这种处理的表面处理DBD设备。它包括检测电极端子处的电压幅度和在所述电极之间循环的电流幅度;以及定义在存在热电弧的情况下在电极的端子处的电压的最大交替数目(n max),以便不超过50焦耳作为所述基板中的耗散能量;当在所述电极之间出现热电弧时,在达到在所述电极的端子处定义的最大电压交变次数之前,通过反向反馈修改所述电极的端子处的电压。

著录项

  • 公开/公告号EA028986B1

    专利类型

  • 公开/公告日2018-01-31

    原文格式PDF

  • 申请/专利权人 ASAHI GLASS COMPANY LIMITED;

    申请/专利号EA20140092247

  • 发明设计人 ERIC;JOSEPH;ERIC;

    申请日2013-07-09

  • 分类号H01J37/32;

  • 国家 EA

  • 入库时间 2022-08-21 12:52:49

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