ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR PRODUCING ELECTRONIC DEVICE AND PHOTOACID GENERATOR

摘要

Provided are: an active light sensitive or radiation sensitive resin composition which contains (A) a photoacid generator that generates an acid having a pKa of -1.40 or more when irradiated with active light or radiation, and (B) a resin that has a repeating unit having an acid-decomposable group, and wherein the Eth sensitivity of the repeating unit having an acid-decomposable group is 5.64 or less; a photoacid generator; and an active light sensitive or radiation sensitive film, a pattern forming method and a method for producing an electronic device, each of which uses this active light sensitive or radiation sensitive resin composition and this photoacid generator. This active light sensitive or radiation sensitive resin composition enables the achievement of extremely excellent roughness performance, exposure latitude and depth of focus especially during the formation of an ultrafine pattern.