URETHANE-BASED PREPOLYMER FOR MANUFACTURE OF POLISHING PAD, POLISHING PAD AND MANUFACTURING METHOD THEREOF

摘要

One embodiment relates to a urethane-based prepolymer for manufacture of a polishing pad which is used in a chemical and mechanical planarization process of a semiconductor, to a polishing pad and to a manufacturing method thereof, wherein the urethane-based prepolymer is excellent in storage stability and can control the reaction speed of a raw material mixture (the time during which the mixture is solidified and the gelation time) in the manufacture of the polyurethane polishing pad by having a functional group in itself. Therefore, when the urethane-based prepolymer is used, it is possible to obtain a catalyst having a desired particle size and to easily manufacture a porous polyurethane polishing pad having a pore with a small deviation between upper and lower portions.;COPYRIGHT KIPO 2018