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METHOD FOR MANUFACTURING TRANSFER FILM COMPRISING SEED LAYER METHOD FOR MANUFACTURING CIRCUIT BOARD USING SELECTIVE ETCHING OF CONDUCTIVE LAYER AND ETCHANT COMPOSITION
METHOD FOR MANUFACTURING TRANSFER FILM COMPRISING SEED LAYER METHOD FOR MANUFACTURING CIRCUIT BOARD USING SELECTIVE ETCHING OF CONDUCTIVE LAYER AND ETCHANT COMPOSITION
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机译:包含种子层的转移膜的制造方法利用导电层和蚀刻剂的选择性蚀刻制造电路板的方法
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摘要
The present invention provides a manufacturing method of a transfer film including a seed layer capable of providing a seed layer for forming a circuit without using a copper foil film. The manufacturing method of a transfer film including a seed layer according to the present invention comprises: a seed layer forming step of forming the seed layer with a first conductive material on a carrier member; an arrangement step of arranging the seed layer on at least one surface of an insulating resin layer; a bonding step of pressing and bonding the seed layer and the insulating resin layer in the thickness direction; and a transfer step of removing the carrier member, and transferring the seed layer to the insulating resin layer.
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