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Lithography Machine and Method for Compensating Surface Profile of a Supporting Frame of a Lithography Machine

机译:光刻机和用于补偿光刻机的支撑框架的表面轮廓的方法

摘要

The present invention provides a photolithography apparatus and a method for correcting the surface profile of a hanging box performed by the photolithography apparatus. A hanging box surface correcting unit is provided on the bottom of the hanging box, and correction can be made for the deformation of the hanging box surface. Among the hanging box surface correcting methods, a hanging box surface deformation detecting module detects the deformation of the hanging box surface, and a closed-loop automatic controller controls the correction force of the hanging box surface correcting unit in accordance with the detected deformation of the hanging box surface, thereby allowing more accurate correction on the surface of the hanging box.
机译:本发明提供一种光刻设备和一种用于校正由该光刻设备执行的悬挂盒的表面轮廓的方法。悬挂箱表面校正单元设置在悬挂箱的底部,并且可以对悬挂箱表面的变形进行校正。在悬挂箱表面校正方法中,悬挂箱表面变形检测模块检测悬挂箱表面的变形,并且闭环自动控制器根据检测到的悬挂箱表面的变形来控制悬挂箱表面校正单元的校正力。悬挂盒表面,从而可以更准确地校正悬挂盒表面。

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