PATTERN FORMATION METHOD ACTIVE-LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION RESIST FILM METHOD FOR MANUFACTURING ELECTRONIC DEVICE AND ELECTRONIC DEVICE

摘要

so double the rotation method and the method of the formation of a different type, the first meeting of the first light and the phenomenon of blood type, and the fiber can be formed in the pattern, method, can use the light of nature or cell uc0acuc120uc131 resin composed of water, resistance to electronic the manufacturing method of the device, and to provide the electronic directory.in particular, the use of mask, half mask pitch and pitch of the pattern can form a pattern formation method, in the light of the city can use the resin composition material or cell death, and resistance to the development of electronic ubc14uc774 manufacturing method, and electronic scene. provide the standard.to process (a), (a) to pattern formation method.the state of lu (), the light from the light amount with the increase in the solubility of the developer is increased by the light, the specified above, the solubility is reduced to just cover the light of cell death or the use of uc870uc131ubb3c formation of justice, (i) the goal is to stop the process, and () the whole amount of the developer on the quality system of 80% above, including the use of the phenomenon.in the light of the phenomenon of blocking the process.