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Method for manufacturing thin silicone wafer by hydrongen hellium co-implantation

机译:氢氦共注入制备薄硅片的方法

摘要

The present invention relates to a solar cell and, more particularly, to a method of manufacturing a thin silicon substrate. Hydrogen and helium ions are implanted into a silicon wafer by the co-implantation of hydrogen and helium. Heat treatment is performed to fabricate a thin silicon substrate by texturing a solar cell according to a crack propagated onto the silicon wafer.
机译:薄硅基板的制造方法技术领域本发明涉及太阳能电池,尤其涉及薄硅基板的制造方法。通过氢和氦的共同注入将氢和氦离子注入到硅晶片中。通过根据传播到硅晶片上的裂缝对太阳能电池进行纹理化处理来执行热处理以制造薄硅基板。

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