首页> 外国专利> METHOD FOR MANUFACTURING CONDUCTIVE WAFERS, METHOD FOR MANUFACTURING THIN-PLATE SINTERED COMPACTS, METHOD FOR MANUFACTURING CERAMIC SUBSTRATES FOR THIN-FILM MAGNETIC HEAD, AND METHOD FOR MACHINING CONDUCTIVE WAFERS

METHOD FOR MANUFACTURING CONDUCTIVE WAFERS, METHOD FOR MANUFACTURING THIN-PLATE SINTERED COMPACTS, METHOD FOR MANUFACTURING CERAMIC SUBSTRATES FOR THIN-FILM MAGNETIC HEAD, AND METHOD FOR MACHINING CONDUCTIVE WAFERS

机译:制造导电性晶片的方法,制造薄板烧结体的方法,制造用于薄膜磁头的陶瓷基体的方法以及加工导电性晶片的方法

摘要

A METHOD FOR MANUFACTURING THIN-PLATE SINTERED COMPACTS ACCORDING TO THE PRESENT INVENTION INCLUDES THE STEPS OF: FORMING A CONDUCTIVE SINTERED COMPACT (10) TO HAVE SUCH A THICKNESS AS TO CAUSE A WARP TO A NEGLIGIBLE DEGREE; AND SLICING THE CONDUCTIVE SINTERED COMPACT (10), THEREBY CUTTING AND DIVIDING THE CONDUCTIVE SINTERED COMPACT INTO AT LEAST TWO WAFERS (10A, 10B). FIGURE 1
机译:一种根据本发明的制造薄板烧结体的方法,包括以下步骤:形成导电烧结体(10)以具有使WARP达到可忽略程度的厚度。并将导电性烧结体(10)切片,从而将导电性烧结体切成至少两个晶片(10A,10B)。图1

著录项

  • 公开/公告号MY120793A

    专利类型

  • 公开/公告日2005-11-30

    原文格式PDF

  • 申请/专利权人 HITACHI METALS LTD;

    申请/专利号MY1999PI00190

  • 发明设计人 MAKOTO FUKUDA;MASANORI CHIKUBA;

    申请日1999-01-16

  • 分类号B23H1/00;B23H7/02;B23H9/02;

  • 国家 MY

  • 入库时间 2022-08-21 21:37:22

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