首页> 外国专利> Silicon carbide - a semiconductor device having a schottky - blocking layer diode and method of making same

Silicon carbide - a semiconductor device having a schottky - blocking layer diode and method of making same

机译:碳化硅-具有肖特基势垒层二极管的半导体器件及其制造方法

摘要

Sic - a semiconductor device having a schottky diode - blocking layer, comprising:a substrate (1), which is made of sic and a first conductivity type, wherein the substrate (1) a main surface, and a rear surface includes;a drift layer (2), which is made of sic and the first conductivity type, the drift layer on the main surface of the substrate (1) is situated, and a lower impurity concentration than the substrate (1) comprises;a schottky - electrode (4), which is positioned on the drift layer (2) is located and a schottky - contact with a surface of the drift layer (2); andan ohmic electrode (5), which is positioned on the rear surface of the substrate (1).the schottky - electrode (4) the drift layer (2) directly are contacted in such a way that the schottky - electrode (4) and the drift layer (2) are lattice matched,the schottky - electrode (4) is formed by metal grains,the drift layer (2) by means of a sic - matrix is formed,the metal grains of the schottky - electrode (4) and the sic - matrix of the drift layer (2) are lattice matched, andthe metal grains of the schottky - electrode (4) have a granular structure.
机译:Sic-具有肖特基二极管-阻挡层的半导体器件,包括:衬底(1),其由sic和第一导电类型制成,其中所述衬底(1)的主表面和后表面包括;漂移层。由SiC和第一导电类型制成的层(2),位于衬底(1)的主表面上的漂移层,且杂质浓度低于衬底(1)的结构包括:肖特基电极( 4),其位于漂移层(2)上并与该漂移层(2)的表面肖特基接触;肖特基电极(4)与漂移层(2)直接接触,使得肖特基电极(4)和漂移层(2)晶格匹配,肖特基-电极(4)由金属颗粒形成,漂移层(2)借助SiC-基体形成,肖特基-电极(4)的金属颗粒漂移层(2)的SiC矩阵是晶格匹配的,肖特基电极(4)的金属颗粒为粒状结构。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号