METHOD FOR IMPLEMENTING A CD-SEM CHARACTERIZATION TECHNIQUE

摘要

The present invention relates to a method for implementing a scanning electron microscopy characterization technique for determining at least one critical dimension of the structure of a sample in the field of dimensional metrology, so-called technical CD-SEM, said method comprising the following steps: - production of an experimental image representative of the structure of the sample and resulting from a scanning electron microscope - from a first theoretical model based on parametric mathematical functions calculating a second theoretical model obtained by algebraic sum of a corrective term, said corrective term being the product of convolution between a given convolution core and the first theoretical model, said second theoretical model comprising a set of parameters to be determined - determination of the set of parameters present in the second theoretical model by means of an adjustment between said second theoretical model and said experimental image.