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METHOD FOR MANUFACTURING A SEMICONDUCTOR MICRO- OR NANOWIRE, SEMICONDUCTOR STRUCTURE COMPRISING SUCH A MICRO- OR NANOWIRE, AND METHOD FOR MANUFACTURING A SEMICONDUCTOR STRUCTURE
METHOD FOR MANUFACTURING A SEMICONDUCTOR MICRO- OR NANOWIRE, SEMICONDUCTOR STRUCTURE COMPRISING SUCH A MICRO- OR NANOWIRE, AND METHOD FOR MANUFACTURING A SEMICONDUCTOR STRUCTURE
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机译:制造半导体微或纳米结构的方法,包括这种微或纳米结构的半导体结构以及制造半导体结构的方法
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摘要
A method of manufacturing at least one semiconducting micro- or nano-wire used for formation of an optoelectric structure, optoelectronic structures including the micro- or nano-wires, and a method enabling manufacture of the photoelectronic structures. The method includes providing a semiconducting substrate, forming a crystalline buffer layer on the substrate, the buffer layer having a first zone over at least part of its thickness composed mainly of magnesium nitride in a form MgxNy, and forming at least one semiconducting micro- or nano-wire on the buffer layer.
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