METHOD FOR MANUFACTURING EUV RETICLES AND RETICLES FOR EUV LITHOGRAPHY

摘要

A method for making an extreme ultraviolet reticle, comprising:a. providing an assembly comprising:(i) an extreme ultraviolet mirror (2); and(ii) a cavity overlaying at least a bottom part of the extreme ultraviolet mirror;b. filling the cavity with an extreme ultraviolet absorbing structure (8) by forming the extreme ultraviolet absorbing structure selectively in the cavity, with respect to any surface not forming part of the cavity.