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SINGLE-SIDE POLISHING HEAD WITH RECESS AND CAP AND HAVING CENTER FLEXIBLE PORTION

机译:单侧抛光头,带有后跟和盖,并具有中心柔性部分

摘要

To provide a polishing head assembly for single-side polishing capable of controlling the flatness of a silicon wafer.SOLUTION: A single-side polishing machine 100 has a head assembly 130 that includes a polishing head and a cap. The polishing head has a recess along the lower portion, and the recess has a concave surface. The cap is disposed in the recess and has an annular wall and a floor extending across the annular wall. The floor is spaced from the concave surface to form a chamber between the concave surface and the floor. The chamber is configured to be pressurized to deflect the floor. The annular wall is attached to the polishing head with an adhesive.SELECTED DRAWING: Figure 1
机译:为了提供一种能够控制硅晶片的平坦度的用于单面抛光的抛光头组件。解决方案:单面抛光机100具有包括抛光头和盖的头组件130。抛光头沿下部具有凹部,该凹部具有凹面。盖布置在凹部中,并具有环形壁和横跨环形壁延伸的底板。地板与凹表面间隔开,以在凹表面和地板之间形成腔室。腔室构造成被加压以使地板偏转。环形壁通过胶粘剂固定在抛光头上。

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