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Centrally flexible single-side polishing head having recess and cap

机译:具有凹口和盖的中央柔性单面抛光头

摘要

A polishing head assembly for single side polishing of silicon wafers is provided. The polishing head assembly includes a polishing head and a cap. The polishing head has a recess along a bottom portion, the recess having a recessed surface. The cap is positioned within the recess, and has an annular wall and a floor extending across the annular wall. The floor is spaced from the recessed surface to form a chamber therebetween. The chamber is configured to be pressurized for deflecting the floor. The annular wall is attached to the polishing head with an adhesive.
机译:提供了一种用于硅晶片的单面抛光的抛光头组件。抛光头组件包括抛光头和盖。抛光头具有沿着底部的凹部,该凹部具有凹面。盖位于凹部内,并具有环形壁和在环形壁上延伸的底板。地板与凹入表面间隔开以在其之间形成腔室。腔室构造成被加压以使地板偏转。环形壁通过粘合剂附接到抛光头。

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