首页> 外国专利> α-Ga 2O3 SINGLE CRYSTAL, METHOD FOR MANUFACTURING THE SAME AND SEMICONDUCTOR ELEMENT USING α-Ga2O3 SINGLE CRYSTAL

α-Ga 2O3 SINGLE CRYSTAL, METHOD FOR MANUFACTURING THE SAME AND SEMICONDUCTOR ELEMENT USING α-Ga2O3 SINGLE CRYSTAL

机译:α-Ga2 O 3单晶,使用α-Ga2 O 3单晶制造相同和半导体元件的方法

摘要

To provide: α-GaOsingle crystal applicable to a semiconductor element; a method for manufacturing the α-GaOsingle crystal; and a semiconductor element using the α-GaOsingle crystal.SOLUTION: The α-GaOsingle crystal is controlled to a carbon concentration of 6×10cmor less. The method for manufacturing α-GaOcomprises the steps of: growing α-GaOon a substrate by a halide vapor phase growth method; removing the substrate; and further growing α-GaOon the α-GaOby the halide vapor phase growth method using the α-GaOobtained in the growing step as a substrate.SELECTED DRAWING: Figure 6
机译:提供:适用于半导体元件的α-GaO单晶; α-GaO单晶的制造方法;解决方案:将α-GaOsingle晶体的碳浓度控制在6×10cm或更小。 α-GaO的制造方法包括以下步骤:通过卤化物气相生长法在基板上生长α-GaO;去除基板;然后使用在生长步骤中获得的α-GaO作为底物,通过卤化物气相生长法在α-GaO上进一步生长α-GaO。图6

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号