Mask configuration for masking a substrate and method for aligning a mask and a substrate

摘要

A mask arrangement (100) for masking a substrate (10) during deposition in a processing chamber is provided. The mask arrangement includes a first plate (110) for supporting the substrate (10) and a second plate (120) for holding a mask (130). The mask (130) is arranged between the substrate (10) and the second plate (120). The first plate (110) includes a first pin (111) and a second pin (112) protruding from the first surface (101). The mask (130) comprises a first hole (131) for receiving the first pin (111) and second hole (132) for receiving the second pin (112). The first hole (131) is configured for allowing a movement of the mask relative to the first plate (110) in the second direction (142), and the second hole (132) is configured for allowing a movement of the mask (130) relative to the first plate (110) in the first direction (141).