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Method for manufacturing composition for rough polishing of silicon wafer, composition set for rough polishing of silicon wafer, and polishing method of silicon wafer

机译:用于硅晶片的粗抛光的组合物的制造方法,用于硅晶片的粗抛光的组合物和硅晶片的抛光方法

摘要

Problem to be solved: to provide a manufacturing method of a silicon wafer rough polishing composition capable of compatibility of an advantage of a concentrated solution and excellent stability and improving edge roll off.A method of manufacturing a silicon wafer rough polishing composition provided by the present invention is a method of manufacturing a silicon wafer rough polishing composition including abrasive grains, basic compounds and water-soluble polymers.This manufacturing method is: preparing the B liquid containing the abrasive and the basic compound; and preparing the B liquid containing the water-soluble polymer Including steps.
机译:要解决的问题:提供一种能够兼顾浓缩液的优点和优异的稳定性并改善边缘滚落的硅晶片粗糙抛光组合物的制造方法。本发明提供一种制造硅晶片粗糙抛光组合物的方法。本发明是一种制造包含磨料颗粒,碱性化合物和水溶性聚合物的硅片粗抛光组合物的方法。制备含有水溶性聚合物的B液。

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