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Method for manufacturing composition for rough polishing of silicon wafer, composition set for rough polishing of silicon wafer, and polishing method of silicon wafer
Method for manufacturing composition for rough polishing of silicon wafer, composition set for rough polishing of silicon wafer, and polishing method of silicon wafer
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机译:用于硅晶片的粗抛光的组合物的制造方法,用于硅晶片的粗抛光的组合物和硅晶片的抛光方法
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摘要
Problem to be solved: to provide a manufacturing method of a silicon wafer rough polishing composition capable of compatibility of an advantage of a concentrated solution and excellent stability and improving edge roll off.A method of manufacturing a silicon wafer rough polishing composition provided by the present invention is a method of manufacturing a silicon wafer rough polishing composition including abrasive grains, basic compounds and water-soluble polymers.This manufacturing method is: preparing the B liquid containing the abrasive and the basic compound; and preparing the B liquid containing the water-soluble polymer Including steps.
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