ABRASIVE PAD DRESSER, POLISHING DEVICE, AND ABRASIVE PAD DRESSING METHOD

摘要

In one embodiment, a polishing pad dresser includes a first base portion, and first convex portions provided in a first region of the first base portion. Furthermore, a width of the first convex portions is 1 to 10 μm, a height of the first convex portions is 0.5 to 10 μm, and a density of the first convex portions in the first region is 0.1 to 50%.