首页> 外国专利> Ellipsometry apparatus and ellipsometry method

Ellipsometry apparatus and ellipsometry method

机译:椭偏仪和椭偏仪

摘要

The present invention provides an ellipsometry device and method that can improve measurement efficiency. The method illuminates the object with 45 ° linearly polarized spherical wave illumination light Q (S1), and uses the spherical wave reference light R having a focusing point near the focusing point of the illumination light Q to reflect the reflected light. The object light O that is the light I is acquired as the hologram I OR , and the hologram I LR of the reference light R is obtained with the spherical wave reference light L having the same focusing point as the illumination light Q (S2). Each hologram p, each of the s-polarized light hologram I κ OR, I κ LR, κ = p, is separated into s and treated, to extract the object light wave, the object beam spatial frequency spectrum G κ (u, v), κ = p, s is generated (S3) (S4). Ellipsometry angles Ψ (θ) and Δ (θ) for each incident angle θ are obtained from the amplitude reflection coefficient ratio == G p / G s = tanΨexp (iΔ). Data of many reflected lights can be collectively acquired to a hologram and processed by many lights with different incident angles θ included in the illumination light Q.
机译:本发明提供了可以提高测量效率的椭圆偏振仪和方法。该方法用45°线偏振球面照明光Q(S1)照明物体,并使用聚焦点在照明光Q的聚焦点附近的球面参考光R来反射反射光。获取作为光I的物体光O作为全息图I OR ,并且利用球面参考光L获得参考光R的全息图I LR 。具有与照明光Q相同的焦点(S2)。每个全息图p,每个s偏振光全息图 IκOR,IκLR, κ= p,被分离为s并进行处理,以提取物光波,从而产生物光束空间频谱Gκ(u, v),κ= p,s(S3)(S4) 。从振幅反射系数比== G p / G s =tanΨexp(iΔ)获得每个入射角θ的椭偏角Ψ(θ)和Δ(θ) 。可以将许多反射光的数据集中地采集到全息图,并由照明光Q中包括的具有不同入射角θ的许多光来处理。

著录项

  • 公开/公告号JPWO2018038064A1

    专利类型

  • 公开/公告日2019-07-11

    原文格式PDF

  • 申请/专利权人 公立大学法人兵庫県立大学;

    申请/专利号JP20180535670

  • 发明设计人 佐藤 邦弘;

    申请日2017-08-21

  • 分类号G01J4/04;G03H1/04;

  • 国家 JP

  • 入库时间 2022-08-21 12:18:37

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号