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Black matrix mask, method for manufacturing black matrix, and application thereof

机译:黑矩阵掩模,黑矩阵的制造方法及其应用

摘要

The present invention relates to a black matrix mask, a method for manufacturing a black matrix, and an application thereof. The black matrix mask includes a light-shielding layer having a predetermined transmission rate and coated along an edge of a black matrix pattern of the black matrix mask. The present invention also provides methods for manufacturing a black matrix, a color filter, an array substrate, and a liquid crystal display device. The method for manufacturing the black matrix includes: Step 100: using the black matrix mask to subject a black matrix material layer on a base plate to exposure; Step 200: subjecting the exposed black matrix material layer to development; and Step 300: subjecting the developed black matrix material layer to baking to finally form a black matrix on the base plate. The black matrix mask and the methods for manufacturing a black matrix, a color filter, an array substrate, and a liquid crystal display devices according to the present invention increase the taper of the black matrix and help enhance the aperture ratio of products.
机译:黑矩阵掩模,黑矩阵的制造方法及其应用技术领域本发明涉及黑矩阵掩模,黑矩阵的制造方法及其应用。黑矩阵掩模包括具有预定透射率并沿着黑矩阵掩模的黑矩阵图案的边缘涂覆的遮光层。本发明还提供了用于制造黑矩阵,滤色器,阵列基板和液晶显示装置的方法。黑色矩阵的制造方法包括:步骤 100 :使用黑色矩阵掩模对基板上的黑色矩阵材料层进行曝光。步骤 200 :对曝光的黑底材料层进行显影处理。步骤 300 :将显影后的黑底材料层进行烘烤,最终在基板上形成黑底。根据本发明的黑矩阵掩模和用于制造黑矩阵的方法,滤色器,阵列基板和液晶显示装置增加了黑矩阵的锥度并有助于提高产品的开口率。

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