首页> 外国专利> Adhesive suitable for a pellicle for EUV lithography and a pellicle using the same adhesive

Adhesive suitable for a pellicle for EUV lithography and a pellicle using the same adhesive

机译:适用于EUV光刻防护膜的胶粘剂和使用该胶粘剂的防护膜

摘要

A pellicle is proposed in which an adhesive layer is formed of an adhesive which undergoes a hardness change at a rate from −50% through +50% of its initial hardness, measured after curing, when it is let to sit in atmosphere of a temperature of 300 degrees C. for 7 days on end; the rate of hardness change being defined by a following equation:Rate of hardness change (%)={(hardness after the sitting)−(initial hardness before the sitting)}÷initial hardness before the sitting)×100.
机译:提出了这样一种防护膜,其中,当将其放置在一定温度的环境中时,固化后测得的粘合层是由粘合剂形成的,该粘合剂层的硬度以其初始硬度的-50%至+ 50%的速率发生变化。在300℃下连续7天;硬度变化率由以下公式定义:<?in-line-formulae description =“在线表达式” end =“ lead”?>硬度变化率(%)= {(坐姿后的硬度)-(坐姿前的初始硬度)}÷坐位前的初始硬度坐姿)×100。<?in-line-formulae description =“ In-line Formulae” end =“ tail”?>

著录项

  • 公开/公告号US10126645B2

    专利类型

  • 公开/公告日2018-11-13

    原文格式PDF

  • 申请/专利权人 SHIN-ETSU CHEMICAL CO. LTD.;

    申请/专利号US201615337747

  • 发明设计人 JUN HORIKOSHI;

    申请日2016-10-28

  • 分类号G03F1/62;G03F1/64;C09J183/00;C09J163/00;

  • 国家 US

  • 入库时间 2022-08-21 12:11:58

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号