首页> 外国专利> Slicing SiC Material by Wire Electrical Discharge Machining

Slicing SiC Material by Wire Electrical Discharge Machining

机译:线切割加工对SiC材料进行切片

摘要

A method of yielding a thinner product wafer from a thicker base SiC wafer cut from a SiC ingot includes: supporting the base SiC wafer with a support substrate: and while the base SiC wafer is supported by the support substrate, cutting through the base SiC wafer in a direction parallel to a first main surface of the base SiC wafer using a wire as part of a wire electrical discharge machining (WEDM) process, to separate the product wafer from the base SiC wafer, the product wafer being attached to the support substrate when cut from the base SiC wafer.
机译:一种由从SiC锭切下的较厚的基础SiC晶片生产更薄的产品晶片的方法,包括:用支撑衬底支撑基础SiC晶片;以及当基础SiC晶片由支撑衬底支撑时,切开基础SiC晶片。作为导线放电加工(WEDM)工艺的一部分,使用导线在平行于基础SiC晶片的第一主表面的方向上,将产品晶片与基础SiC晶片分离,将产品晶片附着到支撑基板上从基础SiC晶圆上切下时。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号