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Slicing SiC material by wire electrical discharge machining

机译:通过电线电气放电加工切割SIC材料

摘要

A method of yielding a thinner product wafer from a thicker base SiC wafer cut from a SiC ingot includes: supporting the base SiC wafer with a support substrate: and while the base SiC wafer is supported by the support substrate, cutting through the base SiC wafer in a direction parallel to a first main surface of the base SiC wafer using a wire as part of a wire electrical discharge machining (WEDM) process, to separate the product wafer from the base SiC wafer, the product wafer being attached to the support substrate when cut from the base SiC wafer.
机译:一种方法,其从SiC锭切割的较厚基座SiC晶片中产生更薄的产品晶片包括:用支撑基板支撑基座SiC晶片:虽然基座SiC晶片由支撑基板支撑,但通过基座SiC晶片切割在与电线电放电加工(WEDM)工艺的一部分平行于基座SiC晶片的第一主表面的方向上,将产品晶片与基座SiC晶片分离,产品晶片附接到支撑基板从基座SiC晶片切割时。

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