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SYSTEM AND METHOD FOR PERFORMING A MULTI-ETCH PROCESS USING MATERIAL-SPECIFIC BEHAVIORAL PARAMETERS IN A 3-D VIRTUAL FABRICATION ENVIRONMENT
SYSTEM AND METHOD FOR PERFORMING A MULTI-ETCH PROCESS USING MATERIAL-SPECIFIC BEHAVIORAL PARAMETERS IN A 3-D VIRTUAL FABRICATION ENVIRONMENT
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机译:在3D虚拟制造环境中使用材料特定的行为参数执行多块工艺的系统和方法
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摘要
A virtual fabrication environment for semiconductor device structures that includes the use of virtual metrology measurement data to optimize a virtual fabrication sequence is described. Further, calibration of the virtual fabrication environment is performed by comparing virtual metrology data generated from a virtual fabrication run with a subset of measurements performed in a physical fabrication environment. Additionally, virtual experiments conducted in the virtual fabrication environment of the present invention generate multiple device structure models using ranges of process and design parameter variations for an integrated process flow and design space of interest.
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