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OPTICAL MASK PLATE, AND METHOD FOR PREPARING OPTICAL MASK SUBSTRATE BASED ON OPTICAL MASK PLATE

机译:光学掩模板以及基于光学掩模板的光学掩模基板的制备方法

摘要

Provided are an optical mask plate (400) and a method for preparing an optical mask substrate (200) based on the optical mask plate (400). The optical mask plate (400) comprises a light-transmitting region (420) and a light-blocking region (410), wherein the light-transmitting region (420) has a designated pattern (1001), the designated pattern comprises (1001) at least one unit pattern, and the unit pattern is configured to be spliced to form at least two target patterns (1002). The optical mask plate (400) can be used to prepare a variety of different optical mask substrates (200), thereby increasing the universality.
机译:提供一种光掩模板(400)以及基于该光掩模板(400)的光掩模基板(200)的制备方法。光学掩模板(400)包括透光区域(420)和遮光区域(410),其中透光区域(420)具有指定图案(1001),该指定图案包括(1001)至少一个单位图案,并且该单位图案被配置为接合以形成至少两个目标图案(1002)。光学掩模板(400)可用于制备各种不同的光学掩模基板(200),从而增加通用性。

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