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ION SOURCE ION BEAM IRRADIATION APPARATUS AND OPERATIONAL METHOD FOR ION SOURCE
ION SOURCE ION BEAM IRRADIATION APPARATUS AND OPERATIONAL METHOD FOR ION SOURCE
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机译:离子源离子束辐照装置及离子源的操作方法
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摘要
An objective of the present invention is to provide an ion source (1) capable of changing ratio of desired ions contained in an ion beam without damaging a cathode. The ion source (1) drawing out an ion beam from a plasma generation container (2) in a predetermined direction comprises: an electron supply unit (3) supplying electrons into the plasma generation container (2); an electromagnet (M0) producing the magnetic field, which captures the electrons from the electron supply unit (3); and a shift means shifting a center position of the magnetic field in the direction drawing out the ion beam to change the ratio of the desired ions included in the ion beam.
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