首页> 外国专利> Copper Copper METHOD FOR THE CONTINUOUS PRODUCTION OF COPPER TRANSPARENT ELECTRODE CIRCUIT FILM USING MOLD AND THE COPPER TRANSPARENT ELECTRODE CIRCUIT FILM PREPARED THEREFROM

Copper Copper METHOD FOR THE CONTINUOUS PRODUCTION OF COPPER TRANSPARENT ELECTRODE CIRCUIT FILM USING MOLD AND THE COPPER TRANSPARENT ELECTRODE CIRCUIT FILM PREPARED THEREFROM

机译:铜铜法连续生产铜透明电极电路膜的方法及制备铜透明电极电路膜的方法

摘要

According to the present invention, a method for continuously producing a copper transparent electrode circuit film using a mold comprises the steps of: immersing a metal mold plate in a copper plating solution for plating with copper; stacking a transparent film on the metal mold plate plated with copper to thermally compress so as to perform lamination to transfer copper of a circuit pattern; separating the metal plate and the laminated transparent film to obtain a transparent electrode circuit film; cleaning the metal mold plate used to manufacture the transparent electrode circuit film; and continuously repeating a series of processes. Accordingly, unlike the existing method, mass production by continuous processing is possible.
机译:根据本发明,使用模具连续制造铜透明电极电路膜的方法包括以下步骤:将金属模板浸入镀铜溶液中以进行镀铜;在镀有铜的金属模板上堆叠透明膜以进行热压缩,以进行层压以转印电路图案的铜。分离金属板和层压的透明膜以获得透明电极电路膜;清洁用于制造透明电极电路膜的金属模板;并不断重复一系列过程。因此,与现有方法不同,可以通过连续加工进行批量生产。

著录项

  • 公开/公告号KR101991286B1

    专利类型

  • 公开/公告日2019-06-20

    原文格式PDF

  • 申请/专利权人 SEO YEONG JIN;

    申请/专利号KR20190033759

  • 申请日2019-03-25

  • 分类号H05K3/10;H05K1/09;H05K3;H05K3/18;

  • 国家 KR

  • 入库时间 2022-08-21 11:48:19

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