Manufacturing method for pattern mask using barrier structure and pattern mask manufacturing device including barrier structure

摘要

A manufacturing method and a manufacturing apparatus of a pattern mask are provided. The method for manufacturing the pattern mask may include preparing a first substrate structure, a second substrate structure, and a barrier structure between the first substrate structure and the second substrate structure in an electrolyte, and the first substrate structure and the first substrate structure. And applying a current between the two substrate structures to etch the first substrate structure to manufacture holes. The apparatus for manufacturing a pattern mask may include an electrolyte, a first substrate structure disposed in the electrolyte, a second substrate structure disposed in the electrolyte and spaced apart from the first substrate structure, and disposed in the electrolyte, and the first substrate structure. And a barrier structure provided between the second substrate structure, and a power supply unit which applies current between the first substrate structure and the second substrate structure to etch the first substrate structure.