COMPOSITION, COMPOSITION FOR FORMING METAL- OR SEMIMETAL-CONTAINING FILM, METAL- OR SEMIMETAL-CONTAINING FILM AND PRODUCTION METHOD OF THE SAME, AND PATTERN FORMING METHOD

摘要

To provide a composition excellent in storage stability, suppressing property for changes in a coating film thickness, and suppressing property for changes in resist sensitivity, a composition for forming a metal- or semimetal-containing film, a metal- or semimetal-containing film and a production method of the film, and a pattern forming method.SOLUTION: The composition of the present invention comprises a first compound containing at least one atom selected from metal atoms and semimetal atoms, and a second compound having a ketonic carbonyl group and an oxy organic group, in which the metal atoms belong to Group 2 to Group 17 of the periodic table. The second compound is preferably represented by formula (1). In formula (1), R, R, Rand Reach independently represent a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms; and Rand Reach independently represent a monovalent organic group having 1 to 20 carbon atoms. In formula (1), Rand Rare preferably alkyl groups having 1 to 6 carbon atoms.SELECTED DRAWING: None