首页>
外国专利>
Optical metrology in lithographic processes using asymmetric sub-resolution features to enhance measurements
Optical metrology in lithographic processes using asymmetric sub-resolution features to enhance measurements
展开▼
机译:光刻工艺中的光学计量学,使用不对称的亚分辨率特征来增强测量
展开▼
页面导航
摘要
著录项
相似文献
摘要
A process of calibrating a model, the process including: obtaining training data including: scattered radiation information from a plurality of structures, individual portions of the scattered radiation information being associated with respective process conditions being characteristics of a patterning process of the individual structures; and calibrating a model with the training data by determining a ratio relating a change in one of the process characteristics to a corresponding change in scattered radiation information.
展开▼