首页> 外国专利> Defect inspection method for light-transmitting film, manufacturing method for linear polarizer film, and manufacturing method for polarizing plate

Defect inspection method for light-transmitting film, manufacturing method for linear polarizer film, and manufacturing method for polarizing plate

机译:透光膜的缺陷检查方法,线性偏振膜的制造方法和偏振片的制造方法

摘要

The inspection method for defects in a light transmissive film according to one embodiment is a method for inspecting defects in a light transmissive film that is the film to be inspected by, while emitting linearly polarized light as illumination light to a film S to be inspected having light transmittance, capturing an image of the film to be inspected by an imaging device 13 via a linear polarizing plate 12B that is disposed between the film to be inspected and the imaging device in a state of the absorption axis A12B intersecting a direction perpendicular to the oscillation plane of the linearly polarized light, wherein when the linearly polarized light is emitted to the film to be inspected, the difference between the maximum intensity wavelength of the incident light transmitted through the film to be inspected and the linear polarizing plate and incident on the imaging device and the maximum sensitivity wavelength of the imaging device is 50 nm or less.
机译:根据一个实施方式的透光膜中的缺陷的检查方法是一种用于检查作为被检查膜的透光膜中的缺陷的方法,同时将线性偏振光作为照明光发射到要检查的膜S上,其中,透过光,以在与吸收膜A12B垂直的方向相交的吸收轴A12B的状态下经由配置在被检查膜与摄像装置之间的线偏振片12B,拍摄由摄像装置13拍摄的被膜。线偏振光的振动平面,其中当线偏振光发射到被检膜时,透射过被检膜的入射光和线偏振片的最大入射光的最大强度波长之间的差成像设备,并且成像设备的最大灵敏度波长为50 nm或更小。

著录项

  • 公开/公告号JP6749321B2

    专利类型

  • 公开/公告日2020-09-02

    原文格式PDF

  • 申请/专利权人 住友化学株式会社;

    申请/专利号JP20170521936

  • 发明设计人 佐藤 景子;穴見 喜久美;

    申请日2016-05-30

  • 分类号G01N21/896;G01N21/892;G02B5/30;

  • 国家 JP

  • 入库时间 2022-08-21 11:33:44

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