Target material for ion plating and method for producing the target material for ion plating

摘要

PROBLEM TO BE SOLVED: To provide an ion plating target material having relatively small volume resistivity and sufficient thermal shock resistance.SOLUTION: The ion plating target material includes boron powder and a fibrous carbon material so that an atomic ratio of boron atoms in the boron powder to carbon atoms in the fibrous carbon material becomes 4:1-6:1 and has an apparent density of 1.34 g/cm-1.67 g/cm. The method for manufacturing the ion plating target material comprises a mixture preparation step of mixing the boron powder with the fibrous carbon material so that they satisfy the atomic ratio to prepare a mixture and a sintering step of sintering the mixture at a temperature of 1000-1300°C while pressing it.SELECTED DRAWING: None