首页> 外国专利> Plating Target Material, Polyamic Solution And Polyimide Resin Solution Which Are Used To Form The Plating Target Material, And Printed-Wiring Board Using THem

Plating Target Material, Polyamic Solution And Polyimide Resin Solution Which Are Used To Form The Plating Target Material, And Printed-Wiring Board Using THem

机译:用于形成镀覆目标材料的镀覆目标材料,聚酰胺溶液和聚酰亚胺树脂溶液以及使用THem的印刷线路板

摘要

A plating-target material of the present invention includes a layer-A to be subjected to electroless plating. The surface roughness of the layer-A is such that an arithmetic mean roughness Ra measured at a cutoff value of 0.002 mm is less than 0.5 μm. The 90° anti-peeling adhesive force of the layer-A is 1.0 N/25 mm or less. Furthermore, the layer-A includes a polyimide resin. Further, a plating-target material of the present invention includes the layer-A to be subjected to electroless plating. The layer-A includes a resin, and the sheet containing the layer-A has an elongation modulus of 1.8 GPa or less. The plating-target material of the present invention has a high adhesiveness to an electroless plating film formed on its surface, even if the surface is not so rough, and it is possible to favorably form electroless plating on the entire surface. Accordingly, the plating-target material of the present invention is suitably applicable to manufacturing of a printed-wiring board or the like. Furthermore, the present invention provides a polyamic acid solution, and a polyimide resin solution for use in the plating-target material, and a printed-wiring board made by using them.
机译:本发明的电镀靶材料包括要进行化学镀的层A。层-A的表面粗糙度使得在0.002mm的临界值处测量的算术平均粗糙度Ra小于0.5μm。层-A的90°抗剥离粘合力为1.0N / 25mm或更小。此外,层A包括聚酰亚胺树脂。此外,本发明的镀覆对象材料包括要进行化学镀的层A。层A包括树脂,并且包含层A的片材具有1.8GPa或更小的伸长模量。即使表面不是很粗糙,本发明的电镀靶材料对在其表面上形成的化学镀膜也具有高粘附性,并且可以在整个表面上有利地形成化学镀。因此,本发明的镀覆对象材料适用于印刷配线板等的制造。此外,本发明提供了用于镀覆目标材料的聚酰胺酸溶液和聚酰亚胺树脂溶液,以及使用它们制备的印刷配线板。

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