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A heat-resistant resin composition, a method for producing a heat-resistant resin film, a method for producing an interlayer insulating film or a surface protective film, and a method for producing an electronic component or a semiconductor component.
A heat-resistant resin composition, a method for producing a heat-resistant resin film, a method for producing an interlayer insulating film or a surface protective film, and a method for producing an electronic component or a semiconductor component.
The purpose of the present invention is to provide a heat-resistant resin composition having excellent stepped embedding properties on a support substrate. In order to achieve the aforementioned purpose, the present invention is configured as described below. Specifically, the present invention is a heat-resistant resin composition containing: as a resin (A) one or more types of resin selected from the group consisting of a polyimide precursor, and a polybenzoxazole precursor; as an organic solvent (B) an organic solvent having a boiling point of 210°C to 260°C at atmospheric pressure; and as an organic solvent (C) an organic solvent having a boiling point of 100°C to less than 210°C at atmospheric pressure; the content of the organic solvent (B) being 5% by mass to 70% by mass with respect to the entire amount of the organic solvents, and the content of the organic solvent (C) being 30% by mass to 95% by mass with respect to the entire amount of the organic solvents.
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