Wafer alignment method and alignment system

摘要

Each wafer is aligned with one another taking into account the features formed on each wafer. Each wafer is formed with a notch that includes a pivot notch that allows contact at two contacts and a stop notch that allows contact at a single contact. The biasing notch urges each wafer into engagement with the two-contact element when the two-contact element is located within the pivot notch, and singles each wafer when the single-contact element is located within the stop notch. It is configured to press to engage one contact element. Each wafer can be bonded together to maintain the alignment of the reference features. [Selection diagram] FIG.