首页> 外国专利> Metal member with Ag underlayer, insulated circuit substrate with Ag underlayer, semiconductor device, insulating circuit substrate with heat sink, and method for producing metal member with Ag underlayer

Metal member with Ag underlayer, insulated circuit substrate with Ag underlayer, semiconductor device, insulating circuit substrate with heat sink, and method for producing metal member with Ag underlayer

机译:具有Ag基底层的金属构件,具有Ag基底层的绝缘电路基板,半导体装置,具有散热器的绝缘电路基底,以及具有Ag基底层的金属构件的制造方法

摘要

An Ag underlayer-attached metallic member includes a metallic member (12) joined with a body to be joined (3) and an Ag underlayer (30) formed on a joining surface of the metallic member (12) with the body to be joined (3), the Ag underlayer (30) includes a glass layer (31) formed on a metallic member (12) side and an Ag layer (32) laminated on the glass layer (31), and an area proportion of voids in an Ag layer (32) surface of the Ag underlayer (30) is 25% or less.
机译:附有Ag底层的金属构件包括与待接合的主体(3)接合的金属构件(12)和形成在金属构件(12)与待接合的主体的接合表面上的Ag底层(30)(参照图3),Ag底层(30)包括形成在金属构件(12)侧的玻璃层(31)和层叠在该玻璃层(31)上的Ag层(32),以及Ag中的空隙的面积比例。 Ag底层(30)的层(32)的表面为25%以下。

著录项

  • 公开/公告号JP6613929B2

    专利类型

  • 公开/公告日2019-12-04

    原文格式PDF

  • 申请/专利权人 三菱マテリアル株式会社;

    申请/专利号JP20160017304

  • 发明设计人 西元 修司;長友 義幸;

    申请日2016-02-01

  • 分类号H01L23/40;H01L23/36;H01L23/12;H01L23/14;

  • 国家 JP

  • 入库时间 2022-08-21 11:31:59

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