首页> 外国专利> Ag UNDERLAYER- ATTACHED METALLIC MEMBER, Ag UNDERLAYER- ATTACHED INSULATING CIRCUIT SUBSTRATE,SEMICONDUCTOR DEVICE, HEAT SINK- ATTACHED INSULATING CIRCUIT SUBSTRATE, AND METHOD FOR MANUFACTURING Ag UNDERLAYER-ATTACHED METALLIC MEMBER

Ag UNDERLAYER- ATTACHED METALLIC MEMBER, Ag UNDERLAYER- ATTACHED INSULATING CIRCUIT SUBSTRATE,SEMICONDUCTOR DEVICE, HEAT SINK- ATTACHED INSULATING CIRCUIT SUBSTRATE, AND METHOD FOR MANUFACTURING Ag UNDERLAYER-ATTACHED METALLIC MEMBER

机译:Ag底层附着的金属构件,Ag底层附着的绝缘电路基板,半导体装置,热沉附着的绝缘电路基板以及制造Ag底层附着的金属构件的方法

摘要

An Ag underlayer-attached metallic member includes a metallic member joined with a body to be joined and an Ag underlayer formed on a joining surface of the metallic member with the body to be joined, the Ag underlayer includes a glass layer formed on a metallic member side and an Ag layer laminated on the glass layer, and an area proportion of voids in an Ag layer surface of the Ag underlayer is 25% or less.
机译:附有Ag底层的金属构件包括与待接合的主体接合的金属构件和在该金属构件与待接合的主体的接合表面上形成的Ag底层,所述Ag底层包括在该金属构件上形成的玻璃层。另外,在玻璃层上层叠有Ag层和Ag层,且Ag底层的Ag层表面中的空隙的面积率为25%以下。

著录项

  • 公开/公告号US2019035703A1

    专利类型

  • 公开/公告日2019-01-31

    原文格式PDF

  • 申请/专利权人 MITSUBISHI MATERIALS CORPORATION;

    申请/专利号US201716072660

  • 发明设计人 SHUJI NISHIMOTO;YOSHIYUKI NAGATOMO;

    申请日2017-01-26

  • 分类号H01L23/14;H01L23/40;H01L23/373;H01L23/08;H01L23/15;H01L23;

  • 国家 US

  • 入库时间 2022-08-21 12:04:48

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