Pattern forming method, method for producing processed substrate, optical component and quartz mold replica, imprint pretreatment coating material and set of the same and imprint resist

摘要

It is an object of the present invention to provide a pattern forming method capable of processing a shot region with high accuracy and uniform accuracy. Step (1) of laminating a layer composed of the curable composition (A1) containing at least the polymerizable compound (a1) on the surface of the substrate, wherein at least the polymerizable compound is formed on the curable composition (A1) layer. (2) discretely dropping and laminating droplets of the curable composition (A2) containing the component (a2), the curable composition (A1) and the curable composition between a mold and the substrate In the method for producing a cured product pattern by an optical imprint technique, which has a step (3) of sandwiching a layer formed by partially mixing the product (A2) in this order, the curable composition (A2) per shot area A pattern forming method, wherein a value Vr / Vc obtained by dividing the volume (Vr) by the volume (Vc) of the curable composition (A1) is 4 or more and 15 or less.