PATTERN FORMING METHOD AND METHODS FOR MANUFACTURING PROCESSED SUBSTRATE, OPTICAL COMPONENT AND QUARTZ MOLD REPLICA AS WELL AS COATING MATERIAL FOR IMPRINT PRETREATMENT AND SET THEREOF WITH IMPRINT RESIST

摘要

The pattern forming method, which is a photo-nanoimprint technology, includes in this order: laying a layer formed of a curable composition (A1) containing at least a polymerizable compound on a surface of a substrate; dispensing liquid droplets of a curable composition (A2) containing at least a polymerizable compound dropwise discretely onto the layer of (A1) to lay the liquid droplets; sandwiching a layer obtained by partially mixing (A1) and (A2) between a mold and the substrate; of irradiating the layer obtained by partially mixing (A1) and (A2) with light from a side of the mold to cure the layer in one stroke; and releasing the mold from the layer formed of the curable compositions after the curing, in which a value Vr/Vc obtained by dividing a volume of (A2) per shot area (Vr) by a volume of (A1) (Vc) is 4 or more and 15 or less.