首页> 外国专利> Ferroelectric capacitor, ferroelectric field effect transistor, and method used in forming an electronic component comprising conductive material and ferroelectric material

Ferroelectric capacitor, ferroelectric field effect transistor, and method used in forming an electronic component comprising conductive material and ferroelectric material

机译:铁电电容器,铁电场效应晶体管以及用于形成包括导电材料和铁电材料的电子部件的方法

摘要

A method used in forming an electronic component comprising conductive material and ferroelectric material comprises forming a non-ferroelectric metal oxide-comprising insulator material over a substrate. A composite stack comprising at least two different composition non-ferroelectric metal oxides is formed over the substrate. The composite stack has an overall conductivity of at least 1×102 Siemens/cm. The composite stack is used to render the non-ferroelectric metal oxide-comprising insulator material to be ferroelectric. Conductive material is formed over the composite stack and the insulator material. Ferroelectric capacitors and ferroelectric field effect transistors independent of method of manufacture are also disclosed.
机译:一种用于形成包括导电材料和铁电材料的电子部件的方法,包括在衬底上方形成包含非铁电金属氧化物的绝缘体材料。包含至少两种不同组成的非铁电金属氧化物的复合叠层形成在衬底上方。复合叠层的总电导率至少为1×10 2 Siemens / cm。该复合叠层用于使包含非铁电金属氧化物的绝缘体材料成为铁电的。在复合叠层和绝缘体材料上形成导电材料。还公开了独立于制造方法的铁电电容器和铁电场效应晶体管。

著录项

  • 公开/公告号US10748914B2

    专利类型

  • 公开/公告日2020-08-18

    原文格式PDF

  • 申请/专利权人 MICRON TECHNOLOGY INC.;

    申请/专利号US201715840251

  • 申请日2017-12-13

  • 分类号H01L27/11507;H01L21/28;H01L29/78;H01L21/02;H01L27/1159;H01L49/02;H01L29/49;H01L29/51;H01L29/66;

  • 国家 US

  • 入库时间 2022-08-21 11:31:04

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