Container for chemical precursors in a deposition process

摘要

Described herein are systems and methods using same for the storage and delivery of chemical precursors that are used in the manufacture of a semiconductor device. In one aspect, the storage system comprises the chemical precursors and a container and the systems have an inlet jet design. The chemical precursor has a low vapor pressure less than about 50 Torr-absolute at container temperature set for delivery. The delivery system further contains a carrier gas. The inlet jet design can deliver the carrier gas at a certain pressure and a certain low rate to impinge upon the surface of the chemical precursors to produce a vapor or droplets of the chemical precursor. The vapor or droplets of the chemical precursor then combine with the carrier gas to provide a precursor-laden fluid stream which will be passed to and used in the processing tool.