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Wafer bonding apparatus and wafer bonding system including the same

机译:晶圆键合装置及包括该晶圆键合装置的晶圆键合系统

摘要

Provided are a wafer bonding apparatus for accurately detecting a bonding state of wafers in a wafer bonding process and/or in a wafer bonding system including the wafer bonding apparatus. The wafer bonding apparatus includes a first supporting plate including a first surface and vacuum grooves for vacuum-absorption of a first wafer disposed on the first surface, a second supporting plate including a second surface facing the first surface. A second wafer is on the second surface. The wafer bonding apparatus and/or the wafer bonding system include a bonding initiator at a center portion of the first supporting plate, and an area sensor on the first supporting plate and configured to detect a propagation state of bonding between the first wafer and the second wafer.
机译:提供了一种用于在晶片键合过程中和/或在包括该晶片键合装置的晶片键合系统中准确地检测晶片的键合状态的晶片键合装置。晶片键合设备包括:第一支撑板,其包括第一表面;以及真空槽,用于真空吸附设置在第一表面上的第一晶片;第二支撑板,其包括面对第一表面的第二表面。第二晶片在第二表面上。晶片键合设备和/或晶片键合系统包括:在第一支撑板的中央部分处的键合引发剂;以及在第一支撑板上的区域传感器,该面积传感器被配置为检测第一晶片与第二晶片之间的键合的传播状态。硅片。

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