首页>
外国专利>
Method for producing substrate with fine projection-and-recess pattern, and substrate with fine projection-and-recess pattern obtained thereby
Method for producing substrate with fine projection-and-recess pattern, and substrate with fine projection-and-recess pattern obtained thereby
展开▼
机译:具有精细凹凸图案的基板的制造方法以及由此获得的具有精细凹凸图案的基板
展开▼
页面导航
摘要
著录项
相似文献
摘要
A method for producing a substrate with a fine projection-and-recess pattern which is excellent in productivity and achieves excellent pattern feature size and accuracy is provided. The method for producing a substrate with a fine projection-and-recess pattern 50 by photo-nanoimprint lithography includes: a first step S1 of applying a photocurable composition 2 to a substrate 1 to form a composition-applied substrate 10; a second step S2 of pressing a mold 20 provided with a fine projection-and-recess pattern into contact with the composition-applied substrate 10 to mold the photocurable composition 2 into recesses 5a and projections 5b; a third step S3 of irradiating the photocurable composition 2 with an active energy line to cure the photocurable composition 2 of the recesses 5a and the projections 5b and peeling off the mold 20; a fourth step S4 of removing the cured recesses 5a and etching the substrate 1 located on the lower surface of the recesses 5a; and a fifth step S5 of removing the cured projections 5b. At the first step S1, the photocurable composition 2 is applied to the substrate 1 by printing using a printing plate.
展开▼
机译:提供一种生产具有优良的凹凸图案的基板的方法,所述凹凸图案的生产率优异并且实现了优异的图案特征尺寸和精度。通过光纳米压印光刻法制造具有精细凹凸图案 50 B>的基板的方法包括:施加光固化性组合物的第一步S 1 B>。 2 B>至基板 1 B>以形成涂覆有组合物的基板 10 B>;第二步骤S 2 B>是将具有精细凹凸图案的模具 20 B>压制成与涂覆有成分的基板 10 B>接触的步骤将光固化性组合物 2 B>模制成凹槽 5 B> a I>和凸起 5 B> b I>;第三步骤S 3 B>,用活性能量线照射光固化性组合物 2 B>,以固化凹部 5的光固化性组合物 2 B>。 B> a I>和凸起 5 B> b I>并剥离模具 20 B>;第四步骤S 4 B>是去除固化的凹槽 5 B> a I>并蚀刻位于下表面的基板 1 B> 5 B> a I>个凹槽;第五步骤S 5 B>是去除固化的凸起 5 B> b I>。在第一步骤S 1 B>中,通过使用印刷版进行印刷,将光固化性组合物 2 B>涂覆到基板 1 B>上。
展开▼